Nanofiltration is a modern membrane process primarily applied to low total dissolved solids water sources, including surface water and fresh groundwater. The main objectives of nanofiltration include softening (removal of polyvalent cations) and the elimination of disinfection by-product precursors. This membrane process is particularly effective in removing substances like natural organic matter and synthetic organic matter, contributing to the enhancement of water quality. Nanofiltration finds application in water treatment to address specific challenges associated with the presence of certain ions and organic compounds in water sources.
The achievement and maintenance of ultrapure water (UPW) are crucial, particularly in the manufacturing processes of semiconductor integrated circuits. The rapid technological advancements in the semiconductor industry have redefined cleanliness standards, emphasizing the need for quantitative removal of various contaminants. Key elements in UPW treatment include addressing colloidal silica, particles, total organic carbon (TOC), bacteria, pyrogens (bacterial fragments), and metal ions. Ensuring the stringent removal of these impurities is essential to meet the exacting requirements of the semiconductor manufacturing processes and to guarantee the production of high-quality integrated circuits.
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